The target exhibit excellent optical transparency, chemical inertness, high hardness, and thermal stability, with low absorption characteristics across the visible to infrared wavelength range. As a key raw material in the field of optical coating, silicon dioxide targets can deposit uniform and dense silicon dioxide films on the surfaces of substrates such as glass, metals, and semiconductors via processes like magnetron sputtering and electron beam evaporation. They are widely used in the preparation of optical anti-reflection films, high-reflection films, protective films, and insulating films.
Purity: 99.99%
Size: Φ18~30x7~18mm; Φ200~350x7~18mm
